Housed in our Integration Lab,This state-of-the-art atomic layer deposition (ALD) system,  utilizes
precursor gases with single atomic layer control to enable conformal coating for nanoscale structure integration.

Capabilities include:

• Single wafer 150 mm.
• Films include Pt (plasma only) .
• Al₂O₃ (plasma/thermal).
• HfO₂ (plasma/thermal).
• SiO₂ (plasma only).
• TiO₂ (plasma/thermal).
• TiN (plasma only, high temp ~450°C).
• Nb₂O₅ (plasma only, limited development).
• Ta₂O₅ (plasma only, limited development).

Technical Specifications:

• Picosun Sunale R150 with Plasma Source and Load Lock.

Contact: John Nogan

Research Highlight:
Mechanical properties of Al₂O₃-functionalized nanoporous gold foams under irradiation
Lionello, D. F.; Ramallo, J. I.; Caro, M.; Wang, Y. Q.; Sheehan, C.; Baldwin, J. K.; Nogan, J.; Caro, A.; Fuertes, M. C.; Ruestes, C. J. Journal of Materials Research 2021, 36 (10), 2001–2009. doi.org/10.1557/s43578-021-00262-x