Center for Integrated Nanotechnologies

Helping you understand, create, and characterize nanomaterials

Low-Pressure Chemical Vapor Deposition

A low pressure chemical vapor deposition (LPCVD) / diffusion furnace located in the CORE Integration Lab

Mechanical support allows for high-density films (e.g. low imperfections) without significant stresses. For micro-electromechanical systems (MEMS) and nano-electromechanical systems (NEMS), the ability to tailor the stress is key as stress and stress gradients are dominant, device failure-inducing mechanisms.

Capabilities include:

Contact: John Nogan

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