The Nova 600 Nanolab from FEI Company combines ultrahigh resolution SEM with FIB capabilities in one system for sample analysis, 2D and 3D machining, and prototyping.

Capabilities include:

• Nabity electron beam lithography (EBL) patterning
• The resolution of 1.1 nm at 15 kV in secondary electron mode is further enhanced when using the STEM detector.
• Allows for electron and ion induced deposition of metals from gas source precursors (currently, Pt) with line widths of 50 nm (ion beam) and 20 nm (electron beam).
• Auto FIB, auto TEM, and pattern generation module is available for ion milling to provide automation of many tasks.
• Includes a Nabity EBL patterning capability.

These capabilities can be found in the CINT Integration Lab. 

Contact: Doug Pete

Research Highlight:

Multicolor Three-Dimensional Tracking for Single-Molecule Fluorence Resonance Energy Transfer Measurements
Keller, A. M.; DeVore, M. S.; Stich, D. G.; Vu, D. M.; Causgrove, T.; Werner, J. H. Analytical Chemistry 2018, 90 (10), 6109–6115. doi.org/10.1021/acs.analchem.8b00244