Helping you understand, create, and characterize nanomaterials
Integration Lab
CINT INTEGRATION LAB — WET PROCESSING
Wet Processing Capabilities
Acid Bench 1 (Custom Fabricators 8’ — Room 1525)
Semi-automatic three station, 18 Mohm DI dual cascade rinse with bath resistivity monitors, process timers, GFCI protected convenience outlets, nitrogen guns, and a DI water sprayer.
Baths accommodate up to 150 mm sample size.
Available chemistries include 6:1 BOE, 49% HF, 35% HCl, 96% H2SO4, 70% HNO3, 30% HAc, 85% H3PO4, ES-1 Cr Etch (37% CAN), KI, I2, C6H8O7 (Citric Acid).
Base Bench 1 (Custom Fabricators 8’ — Room 1523)
Lithography processing only.
Semi-automatic three station, 18 Mohm DI dual cascade rinse with bath resistivity monitors, process timers, GFCI protected convenience outlets, nitrogen guns, and DI water sprayer.
Baths accommodate up to a 150 mm sample size. KOH/TMAH (AZ300 MIF, MF319, MF321, AZ400K, AZ421) developer.
Base Bench 2 (Leatherwood 6’ — Room 1525)
General base operations wet bench with two cascade rinse baths, sink, DI dispense, and dual N2 guns. Typical chemistries supported include NH4OH, (NH4)2S, H2O2, KOH, NaOH, 25% TMAH.
Base Bench 3 (Leatherwood 6’ — Room 1511)
Dual use, general acid/base operations wet bench with two cascade rinse baths, sink, DI dispense, and dual N2 guns.
Supports BEOL parts and equipment cleaning activities. 25% TMAH Etch Bath w/Wollam Condenser for Si etch available on request.
Integrated spinner (Spinner 3) with explosion-proof stirring hotplate, centralized waste collection point, nitrogen guns, process timers, and GFCI protected convenience outlets.
Available chemistries include acetone, methyl alcohol, isopropyl alcohol, NMP (N-Methylpyrrolidone), and EBR-10A (PGMEA).
Solvent Bench 2 (Leatherwood 6’ — Room 1525)
Metal lift-off bench with explosion-proof stirring hotplate, centralized waste collection point, nitrogen guns, process timers, and GFCI protected convenience outlets.
This bench allows removal of metal lift-off operations from the photolithography area.
Solvent Bench 3 (Leatherwood 6’ — Room 1511)
Dirty processing bench with explosion-proof stirring hotplate, centralized waste collection point, nitrogen guns, process timers, and GFCI protected convenience outlets.
This bench supports back end of line (BEOL) processing needs in the parts clean area.
Solvent Bench 4 (Leatherwood 4’ — Room 1504)
Processing bench primarily for EBL operations with cold develop bath, centralized waste collection point, nitrogen guns, acetone air brush, process timers, and GFCI protected convenience outlets.
Once your user project has been accepted, follow these steps to request access to the CINT Integration Laboratory (IL).
User provides accepted user project number and list of desired tools to be accessed to the IL manager, John Nogan.
The IL manager will send a list of the required corporate mandated classes to the user and notify the training coordinator of the student's needs. These classes must be completed prior to getting unescorted access to the IL.
The user completes all of the assigned corporate mandated training classes.
User provides proof of training, i.e. date of completion, to the IL manager.
User reads/signs facility users guides (FUG’s) for the required IL functional groups.
User receives lab specific training from IL Personnel.
The lead process engineer submits a badge request to IL manager for the user. The training coordinator is notified by IL manager to program the card reader to allow badge swipe access.
User receives equipment specific training from an authorized user. This training does not have to include all of the equipment in the IL, only what's needed by the user to complete the desired task. Subsequent training to follow as needed.
User demonstrates proficient operation of the tool to the tool owner. This occurs on an as-needed basis.
User is free to work unsupervised, however the buddy system may still apply depending on the operation and task.