The magnetron sputtering sources feature a modular magnet array that allow operations in a variety of modes depending on the particular application for a specific film deposition run.
Capabilities include:
- Confocal sputtering — Provides rapid sputtering of high quality and uniformly thick metal films (+/– 2.5% thickness uniformity over 4" diameter substrates).
- Unique isolation chimney prevents cross-contamination of target materials and allows deposition profiles to be fine-tuned, affording sequential deposition of a series of metals (2–4) in single runs (without breaking vacuum).
- Substrate holder is updated with heating capabilities: radiant heating to 850°C, over-temp protection, and +/– 1°C temperature stability (oxygen-environment compatible).
Contact: Jennifer Hollingsworth
