This machine was recently refurbished with modernized ergo-friendly chamber/platen design, new Telemark deposition controller, programmable sweep generator, source, automatic indexer and 10 kV high voltage solid-state DC power supply. This machine is undergoing a control system renovation, however, is available on request for thermal evaporation.
Capabilities include:
- Room temperature, 16” diameter platen capable of batch processing of small samples and up to twelve, 100 mm substrates or any combination in a single run; 150 and 200 mm possible.
- Can accommodate multiple wafers, small pieces through 200 mm. Each horizontal stage, face down; samples are typically secured with metal clips or Kapton tape to a 100 mm carrier.
- Supports up to six 15 cc crucibles covering most common metals and a variety of dielectric thin film deposition needs. Room temperature, non-reactive processing.
- E-beam materials: Ag, Al, Au, Co, Cr, Ge, Mo, Ni, Pd, Pt, Ti, W.
- Thermal boat materials: Al, Cr, Au.
- Thermal boats are limited to 500-1000Å (without stage rotation), depending on material.
- Water cooled metal bell jar with highly versatile rotating stage.
- Dual Quartz Crystal Microbalances for precision deposition rate measurement and independent control of thermal and E-beam power supplies.
Contact: Tzu-Ming Lu
