Six physical vapor deposition chambers (3 PVD, 1 E-beam, 1 dual ion beam source, and 1 thermal evaporator) allows our scientists and users to deposit novel materials including complex oxides, strain engineered multilayers, graded high entropy alloys, and thick epitaxial films. Heated and biased stages allow for intimate control over several microstructural features such as texture, density, chemistry, and grain size. A new HiPIMS unit will allow for dense metallic and nitride thin films. In-Situ growth diagnostics including a laser curvature tool, surface acoustic wave (SAW), and RHEED monitoring systems, measure internal stress, modulus, and crystallography of films as they are being grown.
Capabilities include:
- Dual Ion Beam Sputtering (DIBS)
- Five element carousel for Ar ion beam sputtering on a 4-inch substrate.
- An assist ion beam cleans and densifies the growing film.
- AJA Orion Hybrid PVD/E-beam System
- Up to five element confocal sputtering on 4-inch heated (up to 1000C) and rotating substrate
- Glovebox integration for air-sensitive samples
- Reactive N2 and O2 process gas
- RF substrate preclean
- In-house built In-Situ HiPIMS/PVD Chamber
- HiPIMS deposition for high density metal and nitride films
- C-MOS system for internal stress measurements during depositio
- RHEED for in situ crystallography measurements during film growth
- Coming soon: Surface acoustic wave system for modulus and sound speed measurement.
- Bruker DekTak Profilometer
- Roughness and thickness measurements
Future capabilities:
- Characterization chamber with:
Contact:
Ben Derby