DPN has been used to fabricate multiplexed, customized patterns with feature
sizes as small as 50 nm or as large as 10 µm on a variety of substrates that are written with molecular or liquid “inks.” 

Capabilities include:

• Operating under ambient conditions, the system is compatible with a variety
  of organic, inorganic, and biological “ink” materials (including polymers, alkanethiols, silanes, hydrogels, nanoparticles, proteins, nucleic acids, and
  lipids).
• Nanoink 2D array accessory, which allows features to be printed rapidly over
  large areas. This direct-write capability enables patterning without the need for a cleanroom, master stamp or photomask. DPN can print directly onto pre-existing nano- or microscale features, and though essentially a “bottom-up” fabrication technique, it can be used in conjunction with etching methods for rapid prototyping of, e.g., photomasks and plasmonic structures.
• Nanoink AFM Modes Kit for conductive AFM (C-AFM), electrostatic force microscopy (EFM), and magnetic force microscopy (MFM).