Contact 

Hyosim Kim is a scientist at Los Alamos National Laboratory, where she stewards the Gateway's Physical Vapor Deposition Lab. Hyosim's research focuses on understanding defect formation and structural stability in thin films and bulk specimens. Her research experience bridges materials processing, controlled extreme condition experiments, and advanced characterization. She has experience in PVD deposition, ion irradiation, and atomic- and small-scale characterization techniques including TEM, PALS, FIB, SEM, nanoindentation, and APT. Hyosim has led several DOE nuclear energy programs focused on the development and testing of current and next generation nuclear reactor structural materials.

Expertise

• Advanced thin film design and deposition using physical vapor deposition (PVD) systems
• Thin film characterization techniques
• Electron microscopy sample preparation and characterization (SEM, EBSD, EDS, FIB, TEM)
• Ion beam irradiation and material damage characterization
• Radiation effects and coupled extreme condition study in thin film and bulk materials
• High entropy alloy, oxide dispersion strengthened alloy, additively manufactured metals

Capabilities

•  Nanostructured thin film design 

Education

BS, Radiological Science, Korea University

Service

• Materials special issue guest editor
• American Nuclear Society Executive Committee, Accelerator Applications Division, 2026